Overview

We are pleased to announce the International Conference on Atomic Layer Processing of Hybrid Materials 2026 (H-ALP26), to be held in Rijeka, Croatia, bringing together the global community working at the intersection of atomic layer deposition (ALD), molecular layer deposition (MLD), and advanced infiltration techniques such as vapor phase infiltration (VPI), atomic layer infiltration (ALI), or sequential infiltration synthesis (SIS). Building on the momentum of previous Hybrid ALP and VPI/MLD-focused meetings, the 2026 conference will highlight the rapid advancements, emerging applications, and scientific breakthroughs reshaping this dynamic field.

Over the past years, VPI and MLD have progressed far beyond their early roles in hybrid material fabrication. Today, they enable unprecedented control of organic–inorganic interfaces, polymer modification, porous material functionalization, and nanoscale architectures with designer properties. These methods now play a pivotal role across microelectronics, memory devices, membranes and separation technologies, energy storage, photocatalysis, photonic and dielectric coatings, biointerfaces, and sustainable manufacturing.

Hybrid ALP 2026 will be a three-day international conference focused on scientific exchange, technological innovation, and collaboration. The event will feature keynote lectures, invited talks, contributed presentations, poster sessions, and networking opportunities set against the backdrop of Croatia’s vibrant Adriatic coast.

Key topics for H-ALP26 include, but are not limited to:

  • Chemistry and reaction mechanisms in ALD/MLD, VPI, and related methodologies
  • New insights into precursor–material interactions, diffusion dynamics, and infiltration selectivity
  • Modeling and simulation of surface reactions, growth processes, and hybrid material formation
  • Tailored inorganic, organic, and hybrid precursors for next-generation deposition and infiltration
  • Plasma-enhanced, low-temperature, and solution-assisted ALD/MLD routes
  • Area-selective strategies for nanoscale patterning
  • Polymer- and biomaterial-specific infiltration for property tuning
  • Infiltration for semiconductor lithography enhancement, etch resistance, and pattern stabilization
  • VPI for porous materials: MOFs, COFs, aerogels, membranes, catalysts
  • Multistep and programmed infiltration for 3D hybrid architectures
  • Hybrid organic–inorganic thin films and nanostructures
  • Tailored electrical, optical, mechanical, and barrier functionalities
  • High-k and low-k hybrid dielectrics
  • Energy storage materials: solid-state electrolytes, electrodes, and protective layers
  • Photonic and plasmonic coatings, responsive materials, and adaptive surfaces
  • Cutting-edge in situ and operando techniques (optical, X-ray, QCM, IR, ellipsometry)
  • Advanced ex situ analytics (cryo-TEM, atom probe tomography, ToF-SIMS, AFM nano-mechanics)
  • Correlative characterization for hybrid systems
  • Microelectronics and advanced logic/memory device integration
  • Nanopatterning, lithography stabilization, and infiltrated resists
  • Membranes for water purification, gas separation, and ion conduction
  • Catalysis, photocatalysis, and environmental applications
  • Biocompatible and bioactive hybrid coatings
  • Machine learning for precursor design, process optimization, and mechanism discovery
  • Digital twins for ALD/MLD reactor and process control
  • Generative models for predicting hybrid material properties

Sponsors

Sponsorship Inquiries: m.knez@nanogune.eu

Looking Ahead to H-ALP26

We look forward to welcoming researchers, industry partners, and students from around the world to Rijeka in 2026 for an inspiring and collaborative exploration of the future of hybrid materials formed through ALD, MLD, and infiltration-based techniques.

More details on registration, abstract submission, and program updates will be available soon on the conference website.

Join us on the Adriatic coast to shape the next chapter of hybrid materials science.

Important dates ​

Opening of abstract submission

March 15th, 2026

Deadline for abstract submission

April 30th, 2026

Notification to the authors

May 15th, 2026

Final Program

June 1st, 2026

Early bird Registration ends

July 1st, 2026